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1 RESEARCH DISCLOSURE In a lithographic apparatus, for example a deep ultra-violet (DUV) lithographic apparatus or an extreme ultra-violet (EUV) apparatus, contaminant particles may significantly impact the quality of a pattern printed onto a substrate. Thus, the ability to measure the amount of contaminant particles within a lithographic apparatus, and particularly on critical surfaces, is important. To measure the number of particles in a given area on surfaces within the lithographic apparatus, particle measurement cards (PMCs) may be used. PMCs may be formed of a polymer block and a sheet of card foil. The polymer...