# RD 735042
SINGLE INPUT RISLEY BEAM STEERING USING NONIUS / VERNIER GEARING
Publication date
04/06/2025
Language
English
Paper publication
July 2025 Research Disclosure journal
Digital time stamp
e3b0c44298fc1c149afbf4c8996fb92427ae41e4649b934ca495991b7852b855
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Abstract

Public SINGLE INPUT RISLEY BEAM STEERING USING NONIUS / VERNIER GEARING A lithographic apparatus is a machine that applies a desired pattern onto a substrate, usually onto a portion of the substrate. A lithographic apparatus can be used, for example, in the manufacture of integrated circuits (ICs). Driven by the growing demand of manufacturing modern integrated circuits with ever shrinking sizes, lithographic technologies that can offer higher resolution and better reliability are under a fast-paced and extensive development. One of such advancing lithographic technologies is the extreme ultra-violet lithography (also known as EUV or EUVL), which allows for sub-10 nanometre (nm) scale resolution. In lithographic processes, it is de...